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Encapsulates 2D parameterization for pattern generators. Allows transformations and selection of arbitrary variables bound to primitives as well as handling of derivatives. Uses a simple struct to represent bundled dataflow of outputsThis nodes allows artists to place patterns using a 2D solution that typically relies on UVs provided by the artist. You may transform the resulting placement (translate, rotate, etc) or repeat the pattern using the controls below. This node also provides the correct useful derivatives needed for bump mapping.

Input Parameters


Rotation angle around origin.